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Electro-deposition of copper

โœ Scribed by Farmer, Moses G.


Book ID
114460151
Publisher
Institution of Electrical Engineers
Year
1886
Weight
302 KB
Volume
15
Category
Article
ISSN
2054-0671

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๐Ÿ“œ SIMILAR VOLUMES


Electro-deposited copper
โœ J.S.H. ๐Ÿ“‚ Article ๐Ÿ“… 1928 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 62 KB
Electro-Deposition
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โœ N. Dhananjayan; G. Eichkorn; H.R. Mache ๐Ÿ“‚ Article ๐Ÿ“… 1970 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 402 KB

The crystallite formation rate, which corresponds to the nucleation rate, in the potentiostatic electrodeposition of copper increases from ca 105/cm'/s at-20 mV to 105/cm'/s at 200 mV . Three falls in the increasing nucleation rate curve are noticed at -58, -84 and -118 mV . The doublelayer capacita