Electrical resistivity studies of thermally evaporated manganese–rhenium thin films

✍ Scribed by F. Boakye

• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 257 KB
• Volume: 43
• Category: Article
• ISSN: 0011-2275
• DOI: 10.1016/s0011-2275(03)00111-5

✦ Synopsis

Electrical resistivity studies have been carried out on thermally evaporated Mn 100Àx Re x thin films (with X ¼ 0:1-0.5 and 1 at.% Re) over the temperature range from 300 to 1.4 K using the van der Pauw four probe technique. A resistivity minimum a notable characteristic of a-Mn was found in all the specimens with a shift of T min corresponding to the resistivity minimum to upper values as the concentration of Re increases. The results show a tendency towards saturation of the resistivity as the temperature approaches zero implying a Kondo scattering mechanism in the samples. The shift of T min and the characteristic Kondo temperature T K to upper values may be explained in terms of the Kondo scattering.