Electrical Resistance Measurements on Hydrogen-Charged Tantalum and Niobium
✍ Scribed by M. Verani Borgucci; L. Verdini
- Publisher
- John Wiley and Sons
- Year
- 1965
- Tongue
- English
- Weight
- 509 KB
- Volume
- 9
- Category
- Article
- ISSN
- 0370-1972
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📜 SIMILAR VOLUMES
## Abstract Gorsky‐effect measurements on vanadium‐, niobium‐, and tantalum‐samples loaded with different concentrations (0.2 to 4.3 at%) of hydrogen or deuterium are reported. From the relaxation strength the trace of the dipole‐moment tensor of hydrogen and deuterium was determined and found to b
The variations of the equivalent parallel resistance and capacitance of anodic films formed on Ta and Nb in varying concentrations of H2SO4 suggest that the volume of film formed per coulomb is much greater in 100)~, acid, although the dielectric constant is substantially unchanged. The field requir