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Electrical resistance and deformation during the stress-assisted two-way memory effect in Ni45Ti50Cu5 alloy

✍ Scribed by S. Colombo; C. Cannizzo; F. Gariboldi; G. Airoldi


Book ID
116600154
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
929 KB
Volume
422
Category
Article
ISSN
0925-8388

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Stress-assisted two-way memory effect el
✍ F. Gariboldi; S. Besseghini; G. Airoldi πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 526 KB

Electrical resistance (R) and deformation (Ξ΅) are studied in Ti-45 at.%Ni-5 at.%Cu alloy, electrically driven through the transformation range under different constant stress levels in the range 10-500 MPa. Specimens with increasing preliminary cold-work levels (13, 19, 28 and 45%) were selected, in