Stress-assisted two-way memory effect el
β
F. Gariboldi; S. Besseghini; G. Airoldi
π
Article
π
2006
π
Elsevier Science
π
English
β 526 KB
Electrical resistance (R) and deformation (Ξ΅) are studied in Ti-45 at.%Ni-5 at.%Cu alloy, electrically driven through the transformation range under different constant stress levels in the range 10-500 MPa. Specimens with increasing preliminary cold-work levels (13, 19, 28 and 45%) were selected, in