Electrical properties of electroless NiP thin films

✍ Scribed by M. Fernández; J.M. Martínez-Duart; J.M. Albella

• Publisher: Elsevier Science
• Year: 1986
• Tongue: English
• Weight: 269 KB
• Volume: 31
• Category: Article
• ISSN: 0013-4686
• DOI: 10.1016/0013-4686(86)80060-3

✦ Synopsis

Abskact

-The influence of the pH and temperature of the electroless solution on the electrical characteristics of the deposited Ni-P thin films has been determined. The phosphorous content of the films increases when the pH of the solution is decreased giving rise to a diminution of the temperature coefficient of the resistance (TCR). Low TCR films (TCR d 100 ppm "C-') are obtained for pH = 3.4. In this pH range the deposition rate can be in creased by heating the electroless solution to moderate temperatures.