✦ LIBER ✦
Electrical properties of bulk silicon dioxide and SiO2/Si interface formed by tetraethylorthosilicate (TEOS)-oxygen plasma enhanced chemical vapor deposition
✍ Scribed by Hyo-Uk Kim; Shi-Woo Rhee
- Book ID
- 110271273
- Publisher
- Springer US
- Year
- 2000
- Tongue
- English
- Weight
- 210 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0957-4522
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