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Electrical properties of 6.3 nm RF oxygen plasma oxide grown near room temperature with in situ dry cleaning of Si surface

✍ Scribed by R.K Chanana; H.N Upadhyay; R Dwivedi; S.K Srivastava


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
684 KB
Volume
38
Category
Article
ISSN
0038-1101

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