Electrical instability of low-dielectric constant diffusion barrier film (a-SiC:H) for copper interconnect

✍ Scribed by Bing-Yue Tsui; Kuo-Lung Fang; Shyh-Dar Lee

• Book ID: 114538877
• Publisher: IEEE
• Year: 2001
• Tongue: English
• Weight: 153 KB
• Volume: 48
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.954480