Electrical characterization of stressed and broken down SiO[sub 2] films at a nanometer scale using a conductive atomic force microscope

✍ Scribed by Porti, M.; Nafrı́a, M.; Aymerich, X.; Olbrich, A.; Ebersberger, B.

• Book ID: 120033606
• Publisher: American Institute of Physics
• Year: 2002
• Tongue: English
• Weight: 694 KB
• Volume: 91
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1430542