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Electrical characterization of Si/SiO2 interfaces under silicon self-implantation: A Roy Chaudhuri, H Vishnoi and S Kar,Department of Electrical Engineering & Advanced Center for Materials Science, Indian Institute of Technology, Kampur-208016, Indiaand K Srikanth and S Ashok,Center for Electronic Materials and Devices and Department of Engineering Science, The Pennsylvania State University, University Park, PA 16802, USA


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
267 KB
Volume
39
Category
Article
ISSN
0042-207X

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