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Electrical characterization of MOS structures fabricated on SF6 and SF6 + C2CIF5 reactive ion etched silicon

✍ Scribed by E. Castán; J. Vicente; J. Barbolla; E. Cabruja; E. Lora-Tamayo


Book ID
113283607
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
300 KB
Volume
80-81
Category
Article
ISSN
0168-583X

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