Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90 nm node MOSFETs

✍ Scribed by H.W. Chen; S.Y. Chen; K.C. Chen; H.S. Huang; C.H. Liu; F.C. Chiu; K.W. Liu; K.C. Lin; L.W. Cheng; C.T. Lin; G.H. Ma; S.W. Sun

• Book ID: 104002393
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 771 KB
• Volume: 254
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2008.02.196