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Electrical and Thermal Properties of B12P2 Wafers

โœ Scribed by Y. Kumashiro; T. Yokoyama; K. Sato; Y. Ando; S. Nagatani; K. Kajiyama


Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
180 KB
Volume
154
Category
Article
ISSN
0022-4596

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โœฆ Synopsis


Electrical and thermal properties of semiconducting B 12 P 2 wafers designed as B 12 (Si 2 ) x (P 2 ) 1ุŠx were measured up to high temperature. The wafers were grown at 11003C by thermal decomposition of a B 2 H 6 +PH 3 +H 2 gas mixture at 11003C on Si(100) and Si(111) substrates in long-term experiments. The electrical conductivity obeyed band conduction. Thermoelectric power showed high values of 800+1000 V/K at 400+800 K. Measurement of the speci5c heat capacity by di4erential scanning calorimetry (DSC) yielded Debye temperatures of 1200+1300 K and Gru4 neisen parameters of 0.8+0.9. Thermal di4usivity was measured with the use of ring-6ash light in the laser 6ash method. The weak temperature dependence of thermal conductivity re6ects phonon scattering by Si impurities rather than by grain boundaries. Low electrical conductivity produces lower thermoelectric 5gures-of-merit than BP wafers despite the high thermoelectric power.


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