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Electrical and structural properties of Cr-SiO thin films

✍ Scribed by V. Fronz; B. Rösner; W. Storch


Book ID
107862726
Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
530 KB
Volume
65
Category
Article
ISSN
0040-6090

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Structural properties of fluorinated SiO
✍ Fabio Iacona; Giuseppina Casella; Francesco La Via; Salvatore Lombardo; Vito Rai 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 115 KB

Fluorinated SiO (SiOF) films, prepared by plasma enhanced chemical vapour deposition from SiH , N O and CF 2 4 2 4 precursors, have been analysed by infrared (IR) spectroscopy and X-ray photoelectron spectroscopy (XPS) to extract chemical and structural information. Notwithstanding XPS reveals that