Electrical and Structural Properties of Ar+ Implanted Nylon-6 Films

✍ Scribed by D. S. Kelkar; V. Balasubramanian; M. B. Kurup

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 236 KB
• Volume: 42
• Category: Article
• ISSN: 0959-8103
• DOI: 10.1002/(sici)1097-0126(199704)42:4<393::aid-pi729>3.0.co;2-3

✦ Synopsis

The changes in the structural and electrical properties of nylon-6 Ðlms after implantation with an inert gas ion such as Ar`, with energy of 285 keV and at di †erent dose rates (1014 to 1017 ions cm~2), have been investigated. The conductivity, calculated using the projected range as the thickness of the implanted layer, increases by about four to Ðve orders of magnitude for a dose rate of 5 ] 1015 ions cm~2. This is the result of the formation of dangling bonds and free radicals due to implantation. The concentration of free radicals at room temperature measured using an electron spin resonance spectrometer shows that it is proportional to the dose rate up to a certain value, beyond which irradiation-induced damage sets in. The Fourier transform infra-red absorption spectra of the samples indicate certain structural changes due to ion implantation.