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Electrical and optical properties of large area Ga-doped ZnO thin films prepared by reactive plasma deposition

✍ Scribed by S. Shirakata; T. Sakemi; K. Awai; T. Yamamoto

Book ID: 108268870
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 843 KB
Volume: 39
Category: Article
ISSN: 0749-6036
DOI: 10.1016/j.spmi.2005.08.045

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## Abstract InAs co‐doped ZnO films were grown on sapphire substrates by pulsed laser deposition. The grown films have been characterized using X‐ray diffraction (XRD), Hall effect measurements, Atomic force microscope (AFM) and Field emission scanning electron microscope (FESEM) in order to invest