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Efficiency of interface trap generation under hole injections in 2.1 nm thick gate-oxide P-MOSFETs

✍ Scribed by Alain Bravaix; Didier Goguenheim; Nathalie Revil; Laurent Rubaldo; Emmanuel Vincent


Book ID
117146496
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
275 KB
Volume
322
Category
Article
ISSN
0022-3093

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