## Abstract Nanostructured titanium dioxide thin films were prepared using reactive pulsed laser ablation technique. Effects of annealing on the structural, morphological, electrical and optical properties are discussed. The structural, electrical and optical properties of TiO~2~ films are found to
✦ LIBER ✦
Effects of tungsten thickness and annealing temperature on the electrical properties of W–TiO2 thin films
✍ Scribed by Chia-Ching Wu; Cheng-Fu Yang; Yuan-Tai Hsieh; Wen-Ray Chen; Chin-Guo Kuo; Hong-Hsin Huang
- Book ID
- 113529085
- Publisher
- Elsevier Science
- Year
- 2012
- Tongue
- English
- Weight
- 886 KB
- Volume
- 38
- Category
- Article
- ISSN
- 0272-8842
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In this work we have studied the influence of thermal annealing on the structural and electrical properties of W-Ti thin films, deposited on n-type (100) silicon wafers. The films were deposited by d.c. sputtering from a 90:10 wt.% W-Ti target, using Ar ions, to a thickness of ~170 nm. After deposit