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Effects of thermal contact resistance on film growth rate in a horizontal MOCVD reactor

โœ Scribed by Ik-Tae Im; Nag Jung Choi; Masakazu Sugiyama; Yoshiyaki Nakano; Yukihiro Shimogaki; Byoung Ho Kim; Kwang-Sun Kim

Book ID
105676093
Publisher
Springer-Verlag
Year
2005
Tongue
English
Weight
686 KB
Volume
19
Category
Article
ISSN
1738-494X

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โœ C.H. Lin; W.T. Cheng; J.H. Lee ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 989 KB

This paper investigates numerically the effect of embedding a porous medium on the deposition rate in a two-dimensional (2-D) axi-symmetric vertical rotating metalorganic chemical vapor deposition (MOCVD) reactor. The 2-D Navier-Stokes, thermal-energy, and mass transfer equations as well as the wall