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Effects of sputter etching and process techniques on the properties of sputtered aluminum films


Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
164 KB
Volume
30
Category
Article
ISSN
0042-207X

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Sputter etching effect of the substrate
โœ M. Sasase; K. Shimura; K. Yamaguchi; H. Yamamoto; S. Shamoto; K. Hojou ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 643 KB

Beta iron disilicide (b-FeSi 2 ) is one of the candidate materials for a compound semiconductor, which is promising for optoelectronic devices. b-FeSi 2 film has been obtained by ion beam sputter deposition (IBSD) on Si(1 0 0) substrates that are pre-treated by sputter etching by Ne + . In the prese