Effects of rf bias voltage and H2flow rate on the growth of cubic boron nitride films by chemical vapor deposition

✍ Scribed by J. Yu; S. Matsumoto; K. Okada

• Publisher: Springer
• Year: 2005
• Tongue: English
• Weight: 521 KB
• Volume: 80
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/s00339-004-2744-5