✦ LIBER ✦
Effects of rapid thermal treatments on the electrical properties of thin SiO2 gate oxide for DRAM p-channel MOS transistors
✍ Scribed by S Santucci; S Guerrieri; M Passacantando; P Picozzi; F Famà; N Nardi; F Basile
- Book ID
- 117144752
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 265 KB
- Volume
- 280
- Category
- Article
- ISSN
- 0022-3093
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