Effect of post-deposition treatments on
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K. F. Feenstra; P. F. A. Alkemade; E. Algra; R. E. I. Schropp; W. F. van der Weg
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Article
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1999
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John Wiley and Sons
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English
โ 167 KB
๐ 2 views
The eect of dierent post-deposition treatments on the structure of Hot-Wire (HW) deposited intrinsic a-Si:H thin ยฎlms is investigated. These treatments are applied in order to rehydrogenate the top region of the ยฎlm, which, due to the high deposition temperatures of these ยฎlms, becomes depleted of h