✦ LIBER ✦
Effects of post annealing on removal of defect states in silicon oxynitride films grown by oxidation of silicon substrates nitrided in inductively coupled nitrogen plasma
✍ Scribed by Rohana Perera; Akihiro Ikeda; Reiji Hattori; Yukinori Kuroki
- Book ID
- 108388526
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 195 KB
- Volume
- 423
- Category
- Article
- ISSN
- 0040-6090
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