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Effects of polar functional groups and roughness topography of polymer gate dielectric layers on pentacene field-effect transistors

โœ Scribed by Kwonwoo Shin; Sang Yoon Yang; Chanwoo Yang; Hayoung Jeon; Chan Eon Park


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
751 KB
Volume
8
Category
Article
ISSN
1566-1199

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โœฆ Synopsis


The present study analyzed the effects of the polar functional groups and rough topography of the gate dielectric layer on the characteristics of pentacene field-effect transistors. For this purpose, prior to deposition of the organic semiconductor, we introduced polar functional groups and created a rough topography onto the poly(methylmethacrylate)/Al 2 O 3 gate dielectric layer using oxygen plasma treatment, and controlled the number of polar groups using an aging process. The mobility decrease observed after oxygen plasma treatment ranged from 0.2 to <0.01 cm 2 /V s and was related to the many polar functional groups and the rough topography of the gate dielectric, which formed localized trap states in the band gap and created disorder in the crystal structure. In addition, the electric dipole of the polar groups and the fixed interface charges induced a positive shift of the threshold voltage and an increase in the off-state current. After aging of the oxygen plasma-treated gate dielectrics, the reduced number of polar groups led to greatly enhanced charge mobility, a less positive shift of the threshold voltage, a lower off-state current, and lower activation energy compared to layers without aging. However, the mobility still remained lower than for layers without plasma treatment owing to the rough topography of the gate dielectric.


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Stability of pentacene organic field eff
โœ A.L. Deman; J. Tardy ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 216 KB

This paper reports on the processing and the characterization of pentacene organic field effect transistors (OFETs) with a two-layer gate dielectric consisting of a polymer (PMMA) on a high-k oxide (Ta 2 O 5 ). This dielectric stack has been designed in view to combine low voltage operating devices,