✦ LIBER ✦
Effects of plasma treatment in the tungsten process for chemical vapor deposition titanium nitride barrier film beyond nanometer technology
✍ Scribed by K.W. Chen; Y.L. Wang; L. Chang; F.Y. Li; G.J. Hwang
- Book ID
- 108288922
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 938 KB
- Volume
- 498
- Category
- Article
- ISSN
- 0040-6090
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