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Effects of oxygen stoichiometry on electrochromic properties in amorphous tungsten oxide films

โœ Scribed by Akbar I. Inamdar; Y.S. Kim; B.U. Jang; Hyunsik Im; Woong Jung; Dae-Young Kim; Hyungsang Kim


Book ID
113937677
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
722 KB
Volume
520
Category
Article
ISSN
0040-6090

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Tungsten oxide films have been deposited at room temperature from metallic tungsten target onto ITO coated glass substrate with sheet resistance of 15 V/ร using reactive rf magnetron sputtering. The films formed in an Ar+2-25% O 2 gas mixture with total pressure of 10 m Torr and sputtering power 300