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Effects of oxygen pressure on electrical properties of (Na0.5K0.5)NbO3 films grown on Pt/Ti/SiO2/Si substrates

✍ Scribed by Bo-Yun Kim; Tae-Geun Seong; In-Tae Seo; Jin-Seong Kim; Chong-Yun Kang; Seok-Jin Yoon; Sahn Nahm

No coin nor oath required. For personal study only.

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