Effects of MPII-implanted titanium on the electrochromic properties of tungsten trioxide

✍ Scribed by Ko-Wei Weng; Sheng Han; Ya-Chi Chen; Han-Chun Chuang

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 734 KB
• Volume: 266
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2008.02.031

✦ Synopsis

There are great interests in electrochromic (EC) technology for smart windows and displays over the last decade. The substrate, a conductive glass being coated indium tin oxide (ITO) thin films, deposited tungsten trioxide (WO 3 ) using radio-frequency (RF) sputtering and implanted Ti by a metal-plasma ion implantation (MPII) in this study. The optical density (when the implanted dose is less than 2 Â 10 15 ions/cm 2 ) is approximately 1.6 times the unimplanted Ti. At low implanted dose +6 valence tungsten ions improve optical density. At high implanted dose, low-valence tungsten ions reduce the optical density.