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Effects of minute impurities (H, OH, F) on SiO2/Si interface as investigated by nuclear resonant reaction and electron spin resonance
✍ Scribed by Ohji, Y.; Nishioka, Y.; Yokogawa, K.; Mukai, K.; Qiu, Q.; Arai, E.; Sugano, T.
- Book ID
- 114536715
- Publisher
- IEEE
- Year
- 1990
- Tongue
- English
- Weight
- 907 KB
- Volume
- 37
- Category
- Article
- ISSN
- 0018-9383
- DOI
- 10.1109/16.55750
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