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Effects of hydrogen flux on the properties of Al-doped ZnO films sputtered in Ar + H2 ambient at low temperature

✍ Scribed by W.F. Liu; G.T. Du; Y.F. Sun; J.M. Bian; Y. Cheng; T.P. Yang; Y.C. Chang; Y.B. Xu

No coin nor oath required. For personal study only.

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Effects of hydrogen flux on the properties of Al-doped ZnO films sputtered in Ar&#xa0;+&#xa0;H2 ambient at low temperature