Effects of helium ion irradiation on fluorinated plasma polymers

✍ Scribed by Bruno B. Lopes; Wido Schreiner; Celso U. Davanzo; Steven F. Durrant

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 676 KB
• Volume: 204
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2010.02.016

✦ Synopsis

The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C 2 H 2 -SF 6 , C 6 H 6 -SF 6 or C 6 F 6 produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65 dyn cm -1 range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically ∼ 5%). The films produced from SF 6 -containing plasmas also contain S. For irradiation times of 80 min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition.