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Effects of discharge frequency on plasma characteristics and etching characteristics in high density Cl2 plasma: comparison of ultrahigh-frequency plasma and radio-frequency plasma

✍ Scribed by Samukawa, S.; Akashi, H.


Book ID
114558633
Publisher
IEEE
Year
1998
Tongue
English
Weight
147 KB
Volume
26
Category
Article
ISSN
0093-3813

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