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Effects of beam modifiers and immobilization devices on the dose in the build-up region

✍ Scribed by Doracy P. Fontenla; John J. Napoli; Margie Hunt; Daniel Fass; Beryl McCormick; Gerald J. Kutcher


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
963 KB
Volume
30
Category
Article
ISSN
0360-3016

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The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on