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Effects of ambient gases on the formation of SiOxNyfilms by KrF laser ablation of Si3N4target with a shadow mask

✍ Scribed by K. Maruyama; Y. Aoki; Y. Hiroshima; H. Ohta

Book ID: 104678793
Publisher: Springer
Year: 1996
Tongue: English
Weight: 918 KB
Volume: 15
Category: Article
ISSN: 0261-8028
DOI: 10.1007/bf00241152

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