✦ LIBER ✦
Effects of Al2O3 Dielectric Cap and Nitridation on Device Performance, Scalability, and Reliability for Advanced High- κ/Metal Gate pMOSFET Applications
✍ Scribed by Chang, V.S.; Ragnarsson, L.-A.; Hong Yu Yu; Aoulaiche, M.; Conard, T.; KaiMin Yin; Schram, T.; Maes, J.W.; De Gendt, S.; Biesemans, S.
- Book ID
- 114618914
- Publisher
- IEEE
- Year
- 2007
- Tongue
- English
- Weight
- 763 KB
- Volume
- 54
- Category
- Article
- ISSN
- 0018-9383
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