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Effectiveness of Si thin buffer layer for selective SiGe epitaxial growth in recessed source and drain for pMOS

✍ Scribed by P.L. Cheng; C.I. Liao; C.C. Chien; C.L. Yang; S.F. Ting; L.S. Jeng; C.T. Huang; Osbert Cheng; S.F. Tzou; W.S. Hsu


Book ID
113782364
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
763 KB
Volume
107
Category
Article
ISSN
0254-0584

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