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Effective phase control of silicon films during high-rate deposition in atmospheric-pressure very high-frequency plasma: Impacts of gas residence time on the performance of bottom-gate thin film transistors

✍ Scribed by Kakiuchi, H.; Ohmi, H.; Yamada, T.; Hirano, A.; Tsushima, T.; Lin, W.; Yasutake, K.


Book ID
121365096
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
745 KB
Volume
234
Category
Article
ISSN
0257-8972

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