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Effect of water-contact on the roughness of patterned photoresist investigated by AFM analysis

✍ Scribed by Sung Il Ahn; Jae Hyun Kim; Wang-Cheol Zin

Publisher: John Wiley and Sons
Year: 2007
Tongue: English
Weight: 249 KB
Volume: 104
Category: Article
ISSN: 0021-8995
DOI: 10.1002/app.25718

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