Effect of thermal annealing on radiation-induced degradation of bipolar technologies when the dose rate is switched from high to low

✍ Scribed by Ducret, S.; Saigne, F.; Boch, J.; Schrimpf, R.D.; Fleetwood, D.M.; Vaille, J.R.; Dusseau, L.; David, J.P.; Ecoffet, R.

• Book ID: 120249683
• Publisher: IEEE
• Year: 2004
• Tongue: English
• Weight: 215 KB
• Volume: 51
• Category: Article
• ISSN: 0018-9499
• DOI: 10.1109/TNS.2004.839145