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Effect of the chemical nature and concentration of palladium (II) precursors on the palladium deposition by atomic hydrogen electrochemically assisted

✍ Scribed by Luis F. D′Elia Camacho; J. Moncada; J. Calderón; Z. Puentes; K. Saavedra

Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 1000 KB
Volume: 36
Category: Article
ISSN: 0360-3199
DOI: 10.1016/j.ijhydene.2010.12.119

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✦ Synopsis

Pd deposits are obtained by applying À1.92 mA cm À2 during 180 min, employing 0.06 M PdCl 2 þ 1 M HCl and 0.06 M PdCl 2 þ 28% NH 3 solutions. Some features on Pd depositions using x M PdCl 2 þ 1 M HCl (x ¼ 0.130, 0.060, 0.030, 0.025, 0.020 and 0.010) solutions are detailed. Based on roughness factor (S ) and deposition efficiency (3 Pd ) values, Pd deposition is more efficient

A highly rough Pd deposit (S ¼ 357) is obtained, by applying À1.92 mA cm À2 during 180 min, using a 0.020 M PdCl 2 þ 1 M HCl solution.

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