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Effect of substrate temperature on structure and electrical resistivity of laser-ablated IrO2 thin films

โœ Scribed by Chuanbin Wang; Yansheng Gong; Qiang Shen; Lianmeng Zhang


Book ID
108060044
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
387 KB
Volume
253
Category
Article
ISSN
0169-4332

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This paper addresses the effects of substrate temperature on electrical and structural properties of dc magnetron sputter-deposited copper (Cu) thin films on p-type silicon. Copper films of 80 and 500 nm were deposited from Cu target in argon ambient gas pressure of 3.6 mTorr at different substrate