Effect of reactive sputter etching of SiO2 on the properties of subsequently formed MOS systems : U. Niggebrugge and P. Balk. Solid-St. Electron.25 (9), 859 (1982)

• Publisher: Elsevier Science
• Year: 1983
• Tongue: English
• Weight: 115 KB
• Volume: 23
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(83)91335-5