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Effect of pore generating materials on the electrical and mechanical properties of porous low-k films

โœ Scribed by Suhan Kim; Kookheon Char; Junhee Hahn; Jin-Kyu Lee; Do Yeung Yoon; Hee-Woo Rhee; Moon Young Jin


Publisher
The Polymer Society of Korea
Year
2007
Tongue
English
Weight
575 KB
Volume
15
Category
Article
ISSN
1598-5032

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Impact of material/process interactions
โœ Y Travaly; B Eyckens; L Carbonel; A Rothschild; Q.T Le; S.H Brongersma; I Ciofi; ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 784 KB

The impact of material / process interactions on low temperature CVD-O low-k dielectric film properties are 3 presented. The film under investigation is deposited following a three-step process consisting of a low temperature chemical vapor deposition (CVD), an ex situ high temperature cure in a con