Effect of structure and morphology on ph
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O. Zywitzki; T. Modes; P. Frach; D. GlΓΆss
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Article
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2008
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Elsevier Science
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English
β 799 KB
TiO 2 layers were deposited by reactive pulse magnetron sputtering at a substrate temperature of 400 Β°C on float glass. The total pressure during the deposition was varied between 0.3 and 3 Pa for modification of the surface morphology. The morphology of 500 nm thick layers was analyzed by AFM and