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Effect of oxygen partial pressure and VO2content on hexagonal WO3thin films synthesized by pulsed laser deposition technique

✍ Scribed by Ajay Kaushal; Davinder Kaur


Publisher
Springer Netherlands
Year
2010
Tongue
English
Weight
844 KB
Volume
13
Category
Article
ISSN
1388-0764

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✍ K.K.S. Curreem; P.F. Lee; J.Y. Dai πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 580 KB

Dependence of oxygen partial pressures on structural and electrical characteristics of HfAlO (Hf:Al ΒΌ 1:1) high-k gate dielectric ultra-thin films grown on the compressively strained Si 83 Ge 17 by pulsed-laser deposition were investigated. The microstructure and the interfacial structure of the HfA