Molecular weight and processing effects
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A. Kokkinis; E.S. Valamontes; D. Goustouridis; Th. Ganetsos; K. Beltsios; I. Rap
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Article
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2008
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Elsevier Science
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English
โ 264 KB
An experimental set-up based on multiwavelength interferometry, is applied in order to study in-situ the dissolution process of thin resist films. The interference function was the basis for a fitting algorithm, which analyses the experimental data and evaluates the progress of the resist thickness