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Effect of ion implantation on the oxidation resistance of TiAl

โœ Scribed by M. Yoshihara; S. Taniguchi; Y. -C. Zhu

Book ID
107440411
Publisher
The Minerals, Metals & Materials Society
Year
2003
Tongue
English
Weight
513 KB
Volume
34
Category
Article
ISSN
1073-5623

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Effect of silicon and niobium on oxidati
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โœ K Maki; M Shioda; M Sayashi; T Shimizu; S Isobe ๐Ÿ“‚ Article ๐Ÿ“… 1992 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 505 KB

The high temperature air oxidation of titanium aluminide intermetallics with small additions of silicon, niobium and a combination of silicon and niobium was studied in a temperature range between 973 and 1173 K. There was less weight gain when silicon and niobium were added individually. The combin