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Effect of interface traps related to mobile charges on silicon n-channel metal/oxide/semiconductor field effect transistors determined by a charge-temperature technique

✍ Scribed by J.G. Hwu; C.M. Lin; W.S. Wang


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
555 KB
Volume
142
Category
Article
ISSN
0040-6090

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