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Effect of implanted helium on thermal diffusivities of SiC/SiC composites

✍ Scribed by T. Taguchi; N. Igawa; S. Jitsukawa; K. Shimura


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
129 KB
Volume
242
Category
Article
ISSN
0168-583X

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✦ Synopsis


The effect of implanted helium (He) on the thermal diffusivities of SiC/SiC composites was investigated. In the result, thermal diffusivities of SiC/SiC composites decreased after He implantation. The thermal diffusivities of implanted specimens were partly recovered by annealing. From the obtained results in this study, the defect concentration induced by He implantation in the specimens was estimated. The defect concentration rapidly decreased around 500 Β°C. The reason is that He release from SiC starts at 500 Β°C. The defect concentration induced by He implantation increased with increasing the amount of implanted He in the He implantation range less than 30 appm He.


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